The AJA is equipped with DC and RF power supplies to develop metallic and insulating materials into thin film and multilayer heterostructures. Detailed specifications and the characterization capabilities are listed below.
(a) Sputter materials
- Metals and insulators
- Up to 8 materials at a time
- DC and RF power options for metals and insulatos
(b) Substrate holder
- Up to 4-6inch wafers
- Heating up to 1000 °C
- Substrate rotation for uniformity
- Uniformity of ±2% over a 4-inch wafer area
(c) Load-lock
- Sample transfer without breaking vacuum
- Quick sample transfer
